Second Skin

Cooper-Hewitt, National Design Museum is organizing the exhibition Second Skin, was be on view at the Entry 2006 Expo in Essen, Germany, August 26-December 3, 2006. This major design expo featured exhibitions curated by prominent international museums, including MoMA, Vitra Design Museum, and Cooper-Hewitt.

Second Skin is now traveling in Europe and Asia.
Museum of Contemporary Art, Taipei
(10 March - 10 May, 2006)
Kaohsiung Museum of Fine Art
(30 June - 26 August, 2006)

For inquiries regarding becoming a venue
for Second Skin, contact Reiner Packeiser,
Vitra Design Museum

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Checklist
(MS Word doc, updated 02.19.07)

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Room texts
(MS Word doc, updated 04.12.06)

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High-Resolution Images

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Slide show (html)
 
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Exhibition categories

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Installation of first Skin exhibition,
New York City, 2002

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Learn more about Cooper-Hewitt, National Design Museum


About the project

Second Skin is a sequel to Cooper-Hewitt’s 2002 exhibition, Skin: Surface, Substance, and Design. The new exhibition will feature products and projects produced since 2002, as well as selected pieces from the original project.

Second Skin will present examples of products, furniture, fashion, architecture, and media that are expanding the limits of the outer surface. Reflecting the convergence of natural and artificial life, the exhibition will show how enhanced and simulated skins appear throughout the contemporary environment. Designers today continually manipulate the relationship between the inside and outside of objects, garments, and buildings, creating skins that both reveal and conceal, skins that have depth, complexity, and their own behaviors and identities.

Curator: Ellen Lupton,
Cooper-Hewitt, National Design Museum
Asscociate Curator: Jon Cordova ,
Vitra Design Museum
Producer: Vitra Design Museum

The exhibition Skin: Surface, Substance + Design (2002) was made possible in New York City by Swatch, The Horace W. Goldsmith Foundation, NIKE, Inc., the Smithsonian Special Exhibitions Fund, Elise Jaffe and Jeffrey Brown, and BMW Group.

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